Automated Platform Can Synthesise a Variety of Nanomaterials

Surrey NanoSystems has announced the introduction of an automated platform for the production of nanomaterials. Known as the NanoGrowth-Catalyst, the unit incorporates nine nanomaterial processing techniques and can synthesise a variety of nanomaterials including graphene, nanowires and carbon nanotubes.

Application versatility is enhanced by a multi-chamber design that ensures pure processing conditions by continuously maintaining the substrate under vacuum from deposition of catalysts to growth of nanomaterials. This end-to-end vacuum processing is necessary for the precursors and catalysts used for nanomaterials, which are  contaminated by exposure to atmosphere.

“Surrey NanoSystems entered the business world with a platform combining both chemical vapour deposition (CVD) and plasma-enhanced CVD nanomaterial growth techniques,” says Ben Jensen, Chief Technical Officer of the company. “This new platform takes processing flexibility much further. It offers the means to support and speed research across the spectrum of nanomaterials, combined with automated handling and control to help developers turn material growth ideas into practical and repeatable production processes.”

NanoGrowth-Catalyst can replace multiple pieces of equipment with a single automated system. The processing techniques supported by the platform are: low-pressure CVD and  plasma-enhanced CVD, sputtering, sputter etching and ashing, delivery of solid- or liquid-phase catalysts/precursors, creation of controlled-density nanoparticle catalysts at room temperature, thermal annealing, rapid-thermal processing, and a unique form of rapid thermal growth for nanomaterials called RTG which has been developed to prevent agglomeration of catalyst particles.

The platform also supports broadband substrate degassing to remove surface contaminants before processing – helping to ensure the optimum adhesion of catalysts and films. An inductively coupled plasma source can additionally be fitted as an option, at the time of purchase or during the platform’s lifecycle, to optimise the generation of sensitive materials employed in growth processes.

A graphical interface gives users complete control over the processing parameters and steps. With its range of techniques users can employ NanoGrowth-Catalyst for creating or delivering growth catalysts and precursors (the sputtering platform’s dual magnetrons also support co-deposition), depositing nanoparticles at room temperature, catalyst or material activation, growing materials, etching, and deposition of active or passive barrier films.

The system has three chambers: a load/lock chamber and two reaction chambers, plus an automatic transport system for moving wafers/substrates. End-to-end atmosphere-free processing ensures high-purity conditions to minimise contamination and oxidation and ensure consistent and repeatable results. NanoGrowth-Catalyst occupies a cleanroom footprint of 1 × 2 m.

The specification for this platform came partly from requests by users of Surrey NanoSystems’ first growth platform, the single reaction chamber NanoGrowth 1000 n, and from researchers at Surrey NanoSystems and its research partner, the Advanced Technology Institute at the University of Surrey.

“We expect this new growth tool to shorten the time to market for researching nanomaterials and applying them to commercial products,” adds Ben Jensen. “There is nothing to compare with it on the market today and it offers a uniquely powerful means of investigating and developing nanomaterial technologies,” he says.

Tags: carbon nanotubes, graphene, NanoGrowth-Catalyst, nanomaterial processing, nanomaterials, nanowires, Surrey NanoSystems